Differences

This shows you the differences between two versions of the page.

Link to this comparison view

Both sides previous revision Previous revision
idea_for_quartz [2009/08/05 15:40]
ethanminot
idea_for_quartz [2009/08/05 15:40] (current)
ethanminot
Line 1: Line 1:
-    -During the exposure, the quartz should have a dark substrate underneath so that transmitted light does not reflect back and expose the rest of the sample.+    -During the exposure, the quartz should have a dark substrate underneath so that transmitted light does not reflect back and expose the rest of the sample. The rough side of an old silicon wafer seems to work well.
     -Manufacturer'​s recommended softbake temperature is 115 C for 60 s on a hotplate. Quartz has a lower thermal conductivity so it is possible it needs to bake longer at 115 C or temperature needs to be slightly higher (say 120 C). Note that the purpose of the softbake is the obtain the optimal solvent content in the photoresist. The solvent content is more sensitive to bake temperature than bake time.      -Manufacturer'​s recommended softbake temperature is 115 C for 60 s on a hotplate. Quartz has a lower thermal conductivity so it is possible it needs to bake longer at 115 C or temperature needs to be slightly higher (say 120 C). Note that the purpose of the softbake is the obtain the optimal solvent content in the photoresist. The solvent content is more sensitive to bake temperature than bake time. 
     -Agitate the chip when developing. ​     -Agitate the chip when developing. ​

QR Code
QR Code idea_for_quartz (generated for current page)